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Apple Technical PhD Internship Optical Critical Dimension Japan, Yokohama 606828092
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Description
- Develop RCWA-based OCD modeling methodologies for diffractive nanostructures.- Identify critical degrees of freedom (DOF) and fitting parameters required for optimize diffractive element process maps - Explore and propose techniques to enhance the accuracy of model fitting compared against ground truth experimental data- Assess the Gauge Repeatability and Reproducibility (GR&R) of OCD equipment.- Integrate RCWA findings and improve models for supporting design validation simulations and process control recommendations
Minimum Qualifications
- Strong academic background in optical physics, optical engineering, or a related field.
- Experience with OCD metrology, RCWA simulations, or similar optical modeling techniques.
- Analytical mindset with a focus on accuracy and detail in synthesizing simulated and experimental data
- Ability to work independently on complex, research-driven tasks while effectively communicating findings to the team.
- Must hold relevant work permit in Japan for the duration of the internship.
- Currently enrolled in a PhD Program
Preferred Qualifications
- Verbal and written communication skills in English.
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