Analysis of required solutions (problem definitions) of a SEM system -> definition of application-related system requirements
System characterization, including error budget analysis, concept development and elaboration of optimized system properties/solutions § Continuous product enhancement of SEM based metrology tool
Key contact for system related questions for all disciplines – design, electronics development, S/W and application development
Support customer escalations by driving root cause analysis using 7-step / 8D at customer sites worldwide (Fly and fix)
Good command of English, both, spoken and written § Analytical approach to solve problems/technical challenges § Ability to work in an international team § Willingness to travel (up to 50%)
Minimum Qualifications
Higher education, physicist or engineer with specialization in electron beam microscopy
Start as young professional (NCG) possible, 2-3 years professional experience or secondary professional training in this area preferred
Experiences: § Practical experience in working with/in the characterization of electron beam systems as a whole (system understanding) - source, electron optics (charged particle optics), detectors, probe handling, vacuum systems
Imaging and image processing of SEM images
Analytical methods/techniques
Measurement technologies in semiconductor industry
Knowledge: Calibration and optimization processes of SEM systems – both, function and application
Complex relationships of determining parameters of image generation
Image processing and image analysis and their basic algorithms
Optical measuring processes and methods (e.g. interferometry)
Analytical theory of errors and error propagation
Statistical methods to assess data and results
Advantages and disadvantages of existing commercial systems · Tools: 1. Matlab / Python 2. Higher level script languages