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This job requisition is seeking a Failure Analysis & Fault Isolation (FA/FI) Group Leader working inour FSM Ireland Analytical Laboratories
FI/FA Group Leader’sresponsibilitiesinclude (but are not limited to):
Nurture, grow & lead newly formed team, responsible for team health and people management, including hiring, technical coaching, skill development, training, and performance management.
Review team’s work and ensure technical accuracy, provide guidance and recommendations on approaches to characterize complex analyses.
Deliver world class operational performance in safety, quality, and lab throughput along with tactical management of area.
Understand area workflows and equipment, help manage tool fleet including optimizing area to increase output & reduce tool down time.
Present results of key analyses to internal and external customers.
Candidate should have the following
behavioral skills:
Demonstrated strength in leadership, teamwork, problem solving, and effective oral and written communication skills.
Desire to learn and expand knowledge in field.
Ability to work with multi-functional, multi-cultural teams.
Strong in decision making and problem solving.
A good motivator, with ability to listen.
Bachelor's degree in science and engineering major.
Ireland candidates minimum Level 8 Bachelors' degree.
4+ years' experience in a semiconductor failure analysis laboratory.
Qualifications:
Advanced degree (Master's or Ph.D.) in science and engineering major.
10+ years’ experience in a semiconductor failure analysis laboratory supporting advanced technology node technology development.
Strong understanding of TEM sample preparation and imaging.
4+ years’ experience with 6T SRAM & logic failure analysis.
Strong technical understanding of modern fault isolation & failure analysis techniques, from fault isolation, nanoprobing through physical analysis.
Understanding of FinFET technology architecture, including Cu metallization.
Basic understanding on fabrication processes including lithography, dry etch, wet etch, CMP, diffusion, implant, thin films and metrology.
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