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ืžืฆื™ืืช ืžืฉืจืช ื”ื™ื™ื˜ืง ื‘ื—ื‘ืจื•ืช ื”ื˜ื•ื‘ื•ืช ื‘ื™ื•ืชืจ ืžืขื•ืœื ืœื ื”ื™ื™ืชื” ืงืœื” ื™ื•ืชืจ

ื“ืจื•ืฉื™ื Quality Control Chemist ื‘-Aligntech ื‘-United States, San Jose

ืžืฆืื• ืืช ื”ื”ืชืืžื” ื”ืžื•ืฉืœืžืช ืขื‘ื•ืจื›ื ืขื ืืงืกืคื•ื™ื ื˜! ื—ืคืฉื• ื”ื–ื“ืžื ื•ื™ื•ืช ืขื‘ื•ื“ื” ื‘ืชื•ืจ Quality Control Chemist ื‘-United States, San Jose ื•ื”ืฆื˜ืจืคื• ืœืจืฉืช ื”ื—ื‘ืจื•ืช ื”ืžื•ื‘ื™ืœื•ืช ื‘ืชืขืฉื™ื™ืช ื”ื”ื™ื™ื˜ืง, ื›ืžื• Aligntech. ื”ื™ืจืฉืžื• ืขื›ืฉื™ื• ื•ืžืฆืื• ืืช ืขื‘ื•ื“ืช ื”ื—ืœื•ืžื•ืช ืฉืœืš ืขื ืืงืกืคื•ื™ื ื˜!
ื—ื‘ืจื” (1)
ืื•ืคื™ ื”ืžืฉืจื”
ืงื˜ื’ื•ืจื™ื•ืช ืชืคืงื™ื“
ืฉื ืชืคืงื™ื“ (1)
United States
ืื–ื•ืจ
San Jose
ื ืžืฆืื• 2 ืžืฉืจื•ืช
15.09.2024
AT

AlignTech Process Chemist Intern United States, California, San Jose

Limitless High-tech career opportunities - Expoint

ืฉื™ืชื•ืฃ

ื”ืชื—ื‘ืจ/ื™ ื›ื“ื™ ืœื”ื’ื™ืฉ ืžื•ืขืžื“ื•ืช
ืชื™ืื•ืจ:
Work with team to develop new polymer materials synthetic route at optimum conditions. Work with team to develop and optimize individual process steps to deliver material quality specification that can...
ืคืจื˜ื™ ื”ืžืฉืจื” ื”ืžืœืื™ื

ืžืฉืจื•ืช ื ื•ืกืคื•ืช ืฉื™ื›ื•ืœื•ืช ืœืขื ื™ื™ืŸย ืื•ืชืš

10.08.2024
AT

AlignTech Quality Control Chemist United States, California, San Jose

Limitless High-tech career opportunities - Expoint

ืฉื™ืชื•ืฃ

ื”ืชื—ื‘ืจ/ื™ ื›ื“ื™ ืœื”ื’ื™ืฉ ืžื•ืขืžื“ื•ืช
ืชื™ืื•ืจ:
Conduct most types of physical and chemical analyses according to Standard Operating Procedures (SOP), Good Laboratory Practices (GLP) and other regulations/guidelines. Execute test methods and documentations related to raw material,...
ืคืจื˜ื™ ื”ืžืฉืจื” ื”ืžืœืื™ื
ื‘ื•ืื• ืœืžืฆื•ื ืืช ืขื‘ื•ื“ืช ื”ื—ืœื•ืžื•ืช ืฉืœื›ื ื‘ื”ื™ื™ื˜ืง ืขื ืืงืกืคื•ื™ื ื˜. ื‘ืืžืฆืขื•ืช ื”ืคืœื˜ืคื•ืจืžื” ืฉืœื ื• ืชื•ื›ืœ ืœื—ืคืฉ ื‘ืงืœื•ืช ื”ื–ื“ืžื ื•ื™ื•ืช Quality Control Chemist ื‘ื—ื‘ืจืช Aligntech ื‘-United States, San Jose. ื‘ื™ืŸ ืื ืืชื ืžื—ืคืฉื™ื ืืชื’ืจ ื—ื“ืฉ ื•ื‘ื™ืŸ ืื ืืชื ืจื•ืฆื™ื ืœืขื‘ื•ื“ ืขื ืืจื’ื•ืŸ ืกืคืฆื™ืคื™ ื‘ืชืคืงื™ื“ ืžืกื•ื™ื, Expoint ืžืงืœื” ืขืœ ืžืฆื™ืืช ื”ืชืืžืช ื”ืขื‘ื•ื“ื” ื”ืžื•ืฉืœืžืช ืขื‘ื•ืจื›ื. ื”ืชื—ื‘ืจื• ืœื—ื‘ืจื•ืช ืžื•ื‘ื™ืœื•ืช ื‘ืื–ื•ืจ ืฉืœื›ื ืขื•ื“ ื”ื™ื•ื ื•ืงื“ืžื• ืืช ืงืจื™ื™ืจืช ื”ื”ื™ื™ื˜ืง ืฉืœื›ื! ื”ื™ืจืฉืžื• ื”ื™ื•ื ื•ืขืฉื• ืืช ื”ืฆืขื“ ื”ื‘ื ื‘ืžืกืข ื”ืงืจื™ื™ืจื” ืฉืœื›ื ื‘ืขื–ืจืช ืืงืกืคื•ื™ื ื˜.